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Intrinsic ferroelectric properties of strained tetragonal PbZr0.2Ti0.8O3 obtained on layer-by-layer grown, defect-free single crystalline films

机译:应变四方相pbZr0.2Ti0.8O3的本征铁电性质   在逐层生长的无缺陷单晶膜上获得

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摘要

PbZrxTi1-xO3 (PZT) is one of the technologically most important ferroelectricmaterials. Bulk single-domain single crystals of PZT have never beensynthesized for a significant compositional range across the solid-solutionphase diagram. This leaves the fundamental properties of PZT under debate.Synthesis of defect-free single crystalline films enables us to unambiguouslydetermine the intrinsic quantities that describe ferroelectric materials, suchas spontaneous polarization and dielectric constant. Defect-free singlecrystalline, strained PbZr0.2Ti0.8O3 thin films were grown by pulsed-laserdeposition (PLD) onto vicinal SrTiO3 (001) single crystal substrates. Singlecrystalline SrRuO3 films fabricated by PLD were employed as bottom electrode.The PZT films have square shape hysteresis loops and remnant polarizationvalues of up to Pr= 110 micro C/cm2, which is considerably higher than thetheoretical value predicted for (unstrained) bulk single crystalline PZT of theinvestigated composition. The films have a dielectric constant eps33= 90 and apiezoelectric coefficient d33= 50 pm/V.
机译:PbZrxTi1-xO3(PZT)是技术上最重要的铁电材料之一。在整个固溶相图中,PZT的块状单畴单晶从未在明显的组成范围内合成。无缺陷单晶膜的合成使我们能够明确确定描述铁电材料的固有量,例如自发极化和介电常数。通过脉冲激光沉积(PLD)将无缺陷的单晶应变PbZr0.2Ti0.8O3薄膜生长到邻近的SrTiO3(001)单晶衬底上。用PLD制备的SrRuO3单晶薄膜作为底部电极.PZT薄膜具有方形磁滞回线,剩余极化值高达Pr = 110 micro C / cm2,大大高于(无应变)块状单晶PZT的理论值。被调查的组成。所述膜的介电常数eps33 = 90,并且压电系数d33 = 50pm / V。

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